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采用多弧离子镀制备的合金涂层成分与合金阴极靶之间通常存在一定程度的偏差。这种离析效应导致了合金涂层成分控制及合金靶材成分设计的困难。现在的研究工作提出了一个简易的公式an=[(an0 · fn) / i(ai0 · fi) ]· 10 0用于解决这些问题。此公式可以根据合金元素的离化率计算涂层的合金成分。计算结果与实验结果取得了较好的一致。改变该公式的表达方式 an0 =[(an/ fn) / i(ai/ fi) ]·10 0 % ,则易于完成阴极靶源的成分设计 ,并且实现合金涂层的理想成分。
There is usually a certain degree of deviation between the alloy coating composition prepared by multi-arc ion plating and the alloy cathode target. This segregation effect has led to difficulties in controlling the composition of the alloy coating and designing the composition of the alloy target. The current research work proposed a simple formula an = [(an0 · fn) / i (a0 · fi)] · 10 0 for solving these problems. This formula calculates the alloying composition of the coating based on the alloying element’s ionization rate. The calculated results are in good agreement with the experimental results. Changing the expression an0 = [(an / fn) / i (ai / fi)] · 10 0%, it is easy to complete the design of the cathode target composition, and to achieve the ideal composition of the alloy coating.