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AlN films were prepared on Si(100) and quartz glass substrates with high deposition rate of 30 nm·min~(-1) at the temperature of below 85℃ by the magnetic-filtered cathodic arc ion plating(FCAIP) method. The as-deposited AlN films show very smooth surface and almost no macrodroplets. The films are in amorphous state, and the formation of AlN is confirmed by N1s and Al2p X-ray photoelectron spectroscopy(XPS). The XPS depth profile analysis shows that oxygen is mainly absorbed on the AlN surface. The AlN film has Al and N concentrations close to the stoichiometric ratio with a small amount of Al_2O_3. The prepared AlN films are highly transparent over the wave-length range of 210–990 nm. The optical transmission spectrum reveals the bandgap of 6.1 eV. The present technique provides a good approach to prepare large-scale AlN films with controlled structure and good optical properties at low temperature.
AlN films were prepared on Si (100) and quartz glass substrates with high deposition rate of 30 nm · min -1 at 85 ° C by the magnetic-filtered cathodic arc ion plating (FCAIP) method. The as The films are in amorphous state, and the formation of AlN is confirmed by N1s and Al2p X-ray photoelectron spectroscopy (XPS). The XPS depth profile analysis shows that oxygen is mainly absorbed on the AlN surface. The AlN film has Al and N concentrations close to the stoichiometric ratio with a small amount of Al_2O_3. The prepared AlN films are highly transparent over the wave-length range of 210-990 nm. the bandgap of 6.1 eV. The present technique provides a good approach to prepare large-scale AlN films with controlled structure and good optical properties at low temperature.