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针对反射式光电经纬仪的主镜,建立了热分析模型,模拟分析了在无施加和施加温控载荷两种情况下,环境温度对光电经纬仪主镜变形的影响。分析结果表明在给定的镜面变形指标下,随着口径的增大,光电经纬仪的保精度工作温度范围缩小。对径厚比为21:4的K9玻璃主镜,在无施加温控载荷的条件下,当主镜口径小于315mm时,在-40～50℃的环境温度范围内,主镜变形小于55nm。在施加背面接触温控载荷的条件下,当主镜口径小于525mm时,在-40～50℃的环境温度范围内,主镜变形小于55nm。
Aiming at the main mirror of the reflective optoelectronic theodolite, a thermal analysis model was established, and the influence of ambient temperature on the deformation of the primary optic theodolite was simulated and analyzed under no application and temperature-controlled loading. The analysis results show that with the increase of the aperture, the photolithography operating range of the photolithography shrinks under a given specular deformation index. For K9 primary mirror with diameter-thickness ratio of 21: 4, under the condition of no temperature-controlled load, the primary mirror deformation is less than 55nm when the aperture of the primary mirror is less than 315mm in the ambient temperature range of -40 ~ 50 ℃. Under the conditions of applying back-contact temperature-controlled load, when the primary mirror diameter is less than 525mm, the deformation of the primary mirror is less than 55nm in the ambient temperature range of -40 to 50 ° C.