论文部分内容阅读
本文从我们的实际情况出发,介绍了CMA的设计,并讨论了分析器的聚焦特性,分辨率和几何参数的关系,给出了设计程序和主要参数。使用“环电阻”于陶瓷基体上对边缘场畸变作了修正,静电屏蔽消除了外界电磁场的影响。整个CMA与同轴电子枪采用无磁不锈钢Cr16Ni14Mn2制造。整个光学系统和电子倍增器使用μ值高的金属屏蔽。本文中还给出了CMA加工精度的要求。我们设计的CMA已用于AES中,其分辨率为0.3％,信噪比(对银351峰)为430:1。
Based on our actual situation, this paper introduces the design of CMA, and discusses the relationship between the focusing characteristics of the analyzer, the resolution and the geometric parameters, and gives the design procedure and the main parameters. The use of “ring resistance” in the ceramic substrate on the edge of field distortion was corrected, electrostatic shielding eliminates the influence of the external electromagnetic field. The entire CMA and coaxial electron gun using non-magnetic stainless steel Cr16Ni14Mn2 manufacture. The entire optical system and electron multiplier use a high μ metal shield. This article also gives the CMA machining accuracy requirements. The CMA we designed has been used in AES with a resolution of 0.3% and a signal-to-noise ratio (for Silver 351 peak) of 430: 1.