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重离子束轰击聚碳酸酯后,对样品进行陈化和紫外线照射敏化,在优化条件下蚀刻后得到纳米孔径核孔膜。利用电化学沉积技术在核孔膜中制备了最小孔径为30纳米的铜纳米线。获得的铜纳米线/聚碳酸酯可以作为x光纳米光刻的掩模。
After heavy ion bombardment of the polycarbonate, the sample is aged and exposed to ultraviolet light to sensitize it, and the nanopore nanopore is obtained after etching under optimized conditions. Copper nanowires with a minimum pore diameter of 30 nm were prepared by electrochemical deposition in a nuclear pore membrane. The obtained copper nanowires / polycarbonate can be used as a mask for x-ray nanolithography.