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应用空心阴极离子镀膜技术制备的Cr-N薄膜其结构与氮气分压有关。在大气中 ,退火温度为 50 0℃高温条件下 ,Cr-N薄膜的抗氧化性能与N含量有关。由椭偏术测量得出CrN结构的Cr-N薄膜抗氧化性能最佳 ,而Cr2 N结构的Cr-N薄膜抗氧化性能最差 ,且都遵循抛物线氧化规律。
The structure of the Cr-N thin film prepared by Hollow Cathodic Coating is related to the partial pressure of nitrogen. In the atmosphere, the oxidation resistance of Cr-N thin film is related to the content of N under the condition of high annealing temperature of 50 ℃. The results of ellipsometry show that the CrN film has the best oxidation resistance, while the Cr2N film has the worst oxidation resistance and all follow the parabolic oxidation rule.