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采用复合表面活性剂作分散剂,用微波辐射法制备了较大比表面积的纳米复合半导体材料WO3·NiO·0.33H2O,利用XRD、TEM、BET和UV-Vis漫反射光谱技术对固体材料的组成结构和光吸收性能进行了表征。结果表明,微波辐射法制备的材料晶粒小,孔隙率大,结晶度高,比表面积大,为66.37m2/g;材料WO3·NiO·0.33H2O光响应波长达600nm,增强了光能利用率及光催化活性。
The composite nanostructured semiconductor material WO3 · NiO · 0.33H2O with large specific surface area was prepared by microwave radiation using dispersant as surfactant. The composition of solid material was characterized by XRD, TEM, BET and UV-Vis diffuse reflectance spectroscopy Structure and light absorption properties were characterized. The results show that the material prepared by microwave irradiation has the advantages of small grain size, large porosity, high crystallinity and large specific surface area of 66.37m2 / g; the light response wavelength of WO3 · NiO · 0.33H2O material is 600nm, And photocatalytic activity.