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本文介绍采用微型计算机技术研制的一台用于检测离子注入、扩散等半导体掺杂工艺的均匀性、一致性及重复性的自动测量及数据处理系统。该系统的系统误差小于0.05％,可作为检测离子注入机掺杂均匀性的专用设备以及应用于研究所或工厂生产线上快速检测晶片薄层电阻;准确地检测离子注入、扩散工艺的均匀性及重复性,从而能迅速地反馈到工艺中去,为改进工艺提供有力的依据。
This article describes an automated measurement and data processing system developed using microcomputer technology to detect the uniformity, consistency and repeatability of semiconductor doping processes such as ion implantation and diffusion. The systematic error is less than 0.05%, which can be used as a special equipment to detect the doping uniformity of ion implanter and used in the research institute or factory to quickly detect the sheet resistance of the wafer. The system can accurately detect the uniformity of ion implantation and diffusion process and Repeatability, which can quickly feed back to the process to provide a strong basis for improving the process.