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利用真空磁过滤弧沉积(FAD)技术制备得到了无氢的非晶碳膜.由于非晶碳膜中数量极高的四面体键(sp~3键)的存在,这种非晶碳膜也可被称作非晶金刚石薄膜.报道了这种非晶金刚石膜的场电子发射特性,并对其能带结构和发射机理进行了研究.实验结果表明,在阈值电场为15V/μm的情况下,测得的场发射电流超过20μA,薄膜的电子发射行为符合Fowler-Nordheim场发射理论.非晶金刚石膜具有负电子亲合势和较小的有效功函数.如此低的阈值电场和高的发射电流,表明这种非晶金刚石薄膜的场电子发射性能已达到甚至超过目前文献上报道的最好结果,为非晶金刚石膜作为场发射材料在平板显示器等真空微电子器件中的实际应用提供了可能性
Hydrogen-free amorphous carbon films were prepared by vacuum magnetic filtration arc deposition (FAD) technique. Due to the presence of a very large number of tetrahedral bonds (sp ~ 3 bonds) in amorphous carbon films, such amorphous carbon films Can be called as amorphous diamond film.The field electron emission characteristics of this kind of amorphous diamond film are reported and the band structure and emission mechanism of the amorphous diamond film are reported.The experimental results show that at the threshold electric field of 15V / , The measured field emission current of more than 20μA, the film’s electron emission behavior in line with Fowler-Nordheim field emission theory. Amorphous diamond film has a negative electron affinity and a smaller effective work function .This low threshold electric field and high emission The results show that the field emission properties of this kind of amorphous diamond thin films have reached or even exceeded the best results reported in the literature and provide a practical application of amorphous diamond films as field emission materials in vacuum microelectronic devices such as flat panel displays possibility