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介绍了X射线宽带多层膜材料W和B4C的选定方法,依据伯宁(BERNING)公式确定出了在0.154 nm处X射线宽带多层膜的最佳膜对数。引入适当的评价函数,利用具有全局寻优特性且效率较高的遗传算法,在波长0.154 nm处优化设计出了掠入射角(θ)0.5°~0.9°范围内反射率值达到40%的宽角度宽带多层膜。宽带多层膜反射镜采用磁控溅射方法制备,并用X射线衍射仪对样品进行了检测,结果表明在掠入射角(2θ)1.0°~1.8°之间的相对反射率光谱曲线比较平坦。
The selection method of W and B4C for X - ray broadband multilayers was introduced. Based on the BERNING equation, the optimum film logarithm of X - ray broadband multilayers at 0.154 nm was determined. By introducing the appropriate evaluation function and using the genetic algorithm with global optimization and high efficiency, the reflectivity of 40 °% at a grazing incidence angle (θ) between 0.5 ° and 0.9 ° was optimized at a wavelength of 0.154 nm Broadband multi-layer angle film. The broadband multilayer mirrors were prepared by magnetron sputtering method. The samples were detected by X-ray diffractometer. The results showed that the relative reflectance spectrum curve at the grazing incident angle (2θ) of 1.0 ° ~ 1.8 ° was relatively flat.