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以富含硒的日本黑薯的茎尖为材料进行脱毒快繁研究,结果表明剥取小于0.3 mm的甘薯茎尖进行组织培养产生愈伤的最适培养基是MS+6-BA1.0 mg/L+NAA0.1 mg/L;继代培养基为MS;生根培养基为1/2MS+活性炭,填加活性炭的生根培养基能提高生根率。
The results showed that the optimum culture medium for the callus formation of sweet potato stem tips with a diameter less than 0.3 mm was MS + 6-BA1.0 mg / L + NAA0.1 mg / L. The subculture medium was MS. The rooting medium was 1 / 2MS + activated carbon. The rooting medium supplemented with activated carbon could increase the rooting rate.