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针对垂直喷淋式MOCVD反应器的射流现象进行数值模拟研究.通过改变反应腔高度、喷口间距、喷口速度、托盘转速等,对反应器内的流场、温度场、浓度场随上述参数的变化进行详细探讨,进一步探索MOCVD反应器中射流影响的规律.通过模拟发现:(1)在喷口下方的反应腔空间,射流速度、温度和浓度均存在周期性波动,此波动由衬底中心到衬底边缘逐渐衰减;(2)衬底中心处的垂直射流速度大于周边的速度,中心浓度高于边缘浓度,中心温度低于边缘温度;(3)增加反应腔高度,减小喷口间距,减小喷口速度、增加衬底转速,均有利于衬底上方轴向速度和反应前体浓度沿径向分布的平缓.
Aiming at the jet phenomenon of the vertical spray MOCVD reactor, the numerical simulation was carried out.The changes of the flow field, the temperature field and the concentration field in the reactor with the above parameters were changed by changing the height of the reaction chamber, the nozzle spacing, the nozzle speed and the tray rotation speed (1) The space, jet velocity, temperature and concentration in the reaction chamber under the nozzle have periodic fluctuations, which fluctuate from the center of the substrate to the liner (2) the vertical jet velocity at the center of the substrate is faster than the peripheral velocity, the center concentration is higher than the edge concentration and the center temperature is lower than the edge temperature; (3) the height of the reaction chamber is increased, the jet spacing is reduced, Nozzle velocity, increase the substrate speed, are conducive to the substrate above the axial velocity and reaction precursor concentration along the radial distribution of the flat.