Effects of Substrate Temperatures on the Structure and UV-shielding Properties of TiO2-CeO2 Films De

• 作 者: ZHAO Qingnan NI Jiamiao ZHANG
• 机 构: KeyLaboratoryofSilicateMaterialsScienceandEngineering（WuhanUniversityofTechnology）,ChinaLuoyangFloat
• 出 处: 武汉理工大学学报：材料科学英文版
• 发表日期: 2005年4期
• 关键词: 射频磁控管溅射法 TiO2-CeO2薄膜 防辐射覆层玻璃 衬底温度 rf sputtering TiO2-CeO2 films ultraviolet-shie
• 基金项目: 新材料领域项目

TiO2-CeO2 films were deposited on soda-lime glass substrates at varied substrate temperatures by rf magnetron sputtering using 40% molar TiO2- 60% molar CeO2 ceramic target in Ar: O2 = 95: 5 atmosphere. The structure, surface composition, UV-visible spect