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近十年来许多表面分析技术,诸如俄歇电子能谱、X射线光电子能谱、紫外光电子能谱、低能电子衍射等,得到迅速发展。尽管如此,五十年代由Muller发展起来的场离子显微镜仍然是以原子分辨率直接观察固体表面为最基本的工具之一,它能清晰地显示试样表层的原子排列和缺陷,六十年代出现原子探针以后,它与场离子显微镜结合,从此不仅能直接观察表面原子,而且能确定这些原子的化学类别,并对原子过程作出定量研究。场离子显微术的
In the past ten years, many surface analysis techniques, such as Auger electron spectroscopy, X-ray photoelectron spectroscopy, UV photoelectron spectroscopy, low-energy electron diffraction, have been rapidly developed. However, field ion microscopes developed by Muller in the 1950s are still the most basic tools for directly observing solid surfaces at atomic resolution. They clearly show the atomic arrangement and defects on the surface of specimens, which appeared in the 1960s After the atomic probe, it combines with the field ion microscope, from which it can not only directly observe the surface atoms, but also determine the chemical classes of these atoms and quantitatively study the atomic processes. Field ion microscopy