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本文报道在室温基片上淀积MgF_2膜时用惰性气体离子轰击的情况。证明低能(<250eV/离子)轰击薄膜能大大增加其耐磨性和附着力,而其光学性能无明显下降。这一技术的成功对温度敏感的基底上淀积牢固膜层有广泛的意义。
This paper reports the bombardment of inert gas ions when depositing MgF 2 film on a substrate at room temperature. It is demonstrated that the low energy (<250 eV / ion) bombardment film can greatly increase its abrasion resistance and adhesion without any significant decrease of its optical properties. The success of this technique has broad implications for depositing a solid film on a temperature-sensitive substrate.