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等离子体刻蚀法结合透射电子显微术(TEM)和扫描电子显微术(SEM),可以用于纤维结构的研究。但纤维刻蚀后出现伪迹,却是该法应用的一大障碍。作者采用不同的刻蚀条件对纤维进行刻蚀,根据实验结果,对纤维刻蚀中可能产生伪迹的原因以及伪迹的辨别,作了较为详细的讨论。认为:纤维的等离子体刻蚀虽易发生伪迹,但严格控制刻蚀时间,合理选择刻蚀条件和增加刻蚀作用的均匀性,以及改善被刻蚀试样的导电,导热条件和刻蚀后试样的处理,伪迹的出现可大大减少。
Plasma etching combined with transmission electron microscopy (TEM) and scanning electron microscopy (SEM) can be used to study fiber structure. However, artifacts appear after fiber etching, but it is a major obstacle to the application of the law. The authors used different etching conditions to etch the fiber. According to the experimental results, the possible causes of artifacts in fiber etching and the identification of artifacts were discussed in detail. It is considered that although the fiber plasma etching is prone to artifacts, it strictly controls the etching time, reasonably selects the etching conditions and increases the uniformity of the etching effect, and improves the conductivity and thermal conductivity conditions of the etched samples and the etching After the sample processing, the appearance of artifacts can be greatly reduced.