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采用卷对卷装置通过直流反应磁控溅射法在离子束辅助沉积(IBAD)的MgO上生长获得了纯c轴织构的LaMnO_3(LMO)帽子层,详细研究了不同基底温度、氧分压、溅射功率及不同MgO基底对LMO帽子层微结构及其性能的影响,研究表明,LMO具有一定的生长优化工艺,而IBAD-MgO基底性能对LMO的外延生长的影响尤为显著.在最优条件下,最终获得了纯c轴织构、面内外半高宽都较小且表面比较致密平整的LMO帽子层,以此LMO薄膜作为缓冲层,通过化学法外延生长的YBCO超导薄膜,其77K自场下Jc达到1.69 MA/cm~2.
A pure c-axis textured LaMnO_3 (LMO) cap layer was grown by DC-reactive magnetron sputtering on ion-beam assisted deposition (IBAD) MgO by a roll-to-roll method. The effects of substrate temperature, oxygen partial pressure , Sputtering power and the effect of different MgO substrates on the microstructure and properties of LMO cap layer, the results show that LMO has certain growth optimization process, and the IBAD-MgO substrate performance is particularly significant on the epitaxial growth of LMO. Under the conditions of the final obtained pure c-axis texture, the surface half-height width are small and relatively dense surface of the LMO hat layer, the LMO film as a buffer layer, YBCO superconducting film by chemical epitaxial growth, the 77K Jc reached 1.69 MA / cm ~ 2 under the field.