论文部分内容阅读
本文用蒙特卡洛方法对多元合金靶表面的原子逐一进行考查．表面的原子组成由计 算机按比例随机组成。原子的溅射几率由０～１之间的小数组成。是否溅射取决于计算 机产生的随机数．通过计算可以看到，由于各原子的溅射几率不同，表面出现溅射几率 低的原子富集。同时计算结果还告诉我们，不论各原子的溅射几率如何，在不考虑扩散 情况下，经过一段时间的溅射后，溅射出的原子比例与靶材的原子比例相同．由此得到 表面原子富集与溅射几率的关系为（以二元情况为例）Ａ：Ｂ＝ＰＢ：ＰＡ我们在用溅射法制 备超导薄膜中，证实了这一结论。
In this paper, the Monte Carlo method for multi-alloy target surface atoms one by one to examine. The atomic composition of the surface is composed randomly by the computer. The atom sputtering probability is composed of decimals between 0 and 1. Whether sputtering depends on the computer generated random number. It can be seen from the calculation that due to the different sputtering chances of each atom, atomic enrichment with low sputtering probability appears on the surface. At the same time the results also tell us that, regardless of the sputtering probability of each atom, without considering the proliferation of sputtering after a period of time, the proportion of atoms sputtered and the target atomic ratio of the same. The relationship between surface atomic enrichment and sputtering probability is thus obtained (taking the binary case as an example). A: B = PB: PA This conclusion is confirmed by the fact that we have prepared the superconducting thin films by sputtering.