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采用闭合场非平衡磁控溅射离子镀技术在单晶硅(111)衬底上沉积了CrCN镀层,研究了不同C靶电流CrCN镀层的摩擦系数、碳含量和物相组成,并分析了镀层中碳元素的化学态。结果表明:当C靶电流从0增大到1.5 A时,镀层摩擦系数从0.75降至0.3,随着C靶电流的增大,镀层中碳含量呈非线性增大,增速呈从大到小再到大的变化规律。X射线衍射分析表明,随着C靶电流增大,镀层由晶态向非晶态转变;X射线光电子能谱分析表明,碳元素主要以C-C、C-Cr、C-O键形式存在,且随着C靶电流增大,碳键中C-C键的比例也随之增大。
The CrCN coating was deposited on single-crystal Si (111) substrate by closed-field unbalanced magnetron sputtering. The friction coefficient, carbon content and phase composition of different C target current CrCN coatings were investigated. The chemical state of carbon. The results show that when the C target current increases from 0 to 1.5 A, the friction coefficient of the coating decreases from 0.75 to 0.3. With the increase of C target current, the carbon content in the coating increases nonlinearly, Small to large changes in law. X-ray diffraction analysis shows that the coating changes from the crystalline state to the amorphous state with the increase of the C target current. The X-ray photoelectron spectroscopy analysis shows that the carbon elements mainly exist in the form of CC, C-Cr and CO bonds, C target current increases, the proportion of CC bond in the carbon bond also increases.