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介绍了研制的极坐标激光直接写入系统．该系统可用于二元光学掩模的制作．最大掩模直径为１００ｍ ｍ ；最细曝光线宽为１．０μｍ ；套准精度及自动调焦精度分别达±０．３μｍ 和±０．２μｍ ⒚与电子束曝光机相比，该系统具有制作时间短、成本低、利于圆对称掩模制作等特点．
Introduced the developed polar coordinate laser direct writing system. The system can be used for the fabrication of binary optical masks. The maximum mask diameter is 100m m; the finest exposure linewidth is 1.0μm; register accuracy and auto-focus accuracy are ± 0.3μm and ± 0.2μm, respectively. ⒚Compared with electron beam lithography system, Short time, low cost, conducive to the production of symmetrical mask and so on.