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IC光刻掩模质量的好坏,对集成电路产品的性能和成品率的影响极大.目前,国内集成电路生产中检查光刻掩模缺陷的方法,大多数采用显微镜检查法,这种方法花费的时间较长,检验人员的劳动强度大,眼睛极易疲劳,因而容易发生漏检现象.为了改进光刻掩模缺陷的检查工作,华南师大物理系于1982年承担广东省高教局下达的“IC掩模缺陷检查系统”的科研任务,经过两年多的努力,完成了预定的研究任务,广东省高教局于1985年4月24日在华南师大召开了鉴定会,中山大学、华南工学院、暨南大学、广州仪器仪表公司、广州光学应用研究所、中国科学院上海技术物理研究所、中国科学院物理研究所,上海无线电十四厂、佛山无线电四厂等有关高等院校、科研单位、工厂共20个单位、40名代表参加了会议,通过了鉴定证书.会上,代表们听取了各有关报告,进行现场使用审查,经过充分讨论,一致认为:华南师大物理系研究成功的”IC掩模缺陷检查系统”,应用信息光学的原理,理论依据可靠,技术措施可行.与常规的镜检法对比,本系统可以迅速地明显地检查出光刻掩模缺陷的位置和数量,大大缩短检查时间,减轻检验人员的劳动强度,降低漏检率,显著地提高工
IC lithography mask quality is good or bad, the performance of integrated circuit products and yield a great impact.Currently, the domestic production of integrated circuits to check the lithography mask defects, the majority of microscopic examination method, this method Spent a longer time, the inspectors of labor-intensive, easy to fatigue eye, which is prone to missed inspection.In order to improve the inspection of photolithographic mask defects, South China Normal University Department of Physics in 1982, Guangdong Provincial Bureau of Higher Education issued Of the “IC mask defect inspection system” research mission, after more than two years of hard work, completed the scheduled research mission, Guangdong Provincial Bureau of Higher Education on April 24, 1985 in South China Normal University held an appraisal meeting, Sun Yat-sen University, South China Institute of Technology, Jinan University, Guangzhou Instrumentation Company, Guangzhou Institute of Optical Applications, Chinese Academy of Sciences Shanghai Institute of Technical Physics, Institute of Physics, Chinese Academy of Sciences, Shanghai Radio 14 Factory, Foshan Radio 4 Factory and other institutions of higher learning, research institutes , Factory a total of 20 units, 40 delegates attended the meeting, passed the certificate of appraisal. At the meeting, delegates listened to the relevant reports, on-site use of the review, the Fully discussed, agreed that: South China Normal University Department of Physics, the successful study of “IC mask defect inspection system”, the application of information optical principles, based on reliable, technical measures feasible.Compared with the conventional microscopy, the system can quickly Significantly check the position and the number of photolithographic mask defects, greatly reducing the inspection time, reduce the labor intensity of the inspectors, reduce the missed inspection rate, significantly improve workers