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低温低压下生长的金刚石薄膜由于具备一系列优良的性能而在机械、电子和光学等领域有着广泛的应用前景。本文阐述了用等离子化学气相沉积(PCVD)法生长金刚石薄膜的工作及其研究。等离子区由射频电源激发产生,反应气体为甲烷(CH_4)、氢(H_2)和氩(Ar)组成。由气体离解产生的新物质沉积在反应室内的硅单晶片衬底表面上。所得薄膜用光学显微镜和反射高能电子衍射(RHEED)作了观察。结果表明沉积层为微粒状立方金刚石多晶
The growth of diamond films under low temperature and low pressure has a wide range of applications in the fields of mechanics, electronics and optics due to their excellent performance. This paper describes the work and research on the growth of diamond films by plasma chemical vapor deposition (PCVD). The plasma region is excited by a radio frequency power source, and the reaction gas is composed of methane (CH 4), hydrogen (H 2) and argon (Ar). New material resulting from gas dissociation is deposited on the surface of the silicon single wafer substrate within the reaction chamber. The resulting film was observed with a light microscope and a reflection high-energy electron diffraction (RHEED). The results show that the deposited layer is granular cubic diamond polycrystal