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罗门哈斯电子材料公司微电子技术事业部与道康宁公司宣布延展双方的共同开发协议,以针对次-65nm的快闪记忆体(node flash)、DRAM和逻辑元件合作开发创新的旋涂式硅硬膜抗反射(spin-on silicon hardmask anti-reflective)涂层产品。罗门哈斯电子材料与道康宁是在两年前展开此项
Rohm and Haas Electronic Materials and Microelectronics Division and Dow Corning Announce Extend Mutual Development Agreement to Develop Innovative Spin-On Silicon for Sub-65nm Flash, DRAM and Logic Components Spin-on silicon hardmask anti-reflective coating products. Rohm and Haas Electronic Materials and Dow Corning started this project two years ago