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采用垂直靶向脉冲激光沉积(VTPLD)法,在室温及Ar气环境下于玻璃基底上沉积Ag纳米薄膜。在Ag纳米薄膜上用提拉法获得一层聚苯胺(PANI)电致变色薄膜。采用X射线衍射(XRD)、扫描电镜(SEM)和数字万用表考察激光功率对沉积的Ag纳米薄膜的晶型结构、表面形貌和电导率的影响。采用循环伏安法、紫外可见漫反射光谱法对不同激光功率下沉积的Ag纳米薄膜上PANI薄膜的电致变色性能、结构变化进行分析。XRD和SEM结果显示,在玻璃基底上成功地获得粒径为30~50nm的Ag纳米薄膜且其电阻值为1~5Ω。在实验的最优条件下,激光功率为17W时获得的Ag纳米薄膜致密均匀、结晶好和电阻值较小;在优化的玻璃基底/Ag纳米薄膜上附着的PANI薄膜,电致变色电压最低、红移范围明显。
The vertical target-directed pulsed laser deposition (VTPLD) method was used to deposit Ag nanostructured thin films on a glass substrate at room temperature and Ar gas atmosphere. A polyaniline (PANI) electrochromic thin film was obtained by Czochralski method on Ag nanosheet. X-ray diffraction (XRD), scanning electron microscopy (SEM) and digital multimeter were used to investigate the effect of laser power on the crystal structure, surface morphology and conductivity of the deposited Ag nanofilms. Cyclic voltammetry and UV-vis diffuse reflectance spectroscopy were used to analyze the electrochromic properties and structural changes of PANI thin films deposited on Ag nanofilms with different laser powers. The results of XRD and SEM showed that Ag nanostructured films with 30-50 nm diameter were successfully obtained on glass substrates and their resistance was 1 ~ 5Ω. Under the optimum conditions, the Ag nanofilms obtained at the laser power of 17W are dense and uniform with good crystallinity and low resistance. The PANI films deposited on the optimized glass substrate / Ag nanosheet have the lowest electrochromic voltage, Redshift range is obvious.