论文部分内容阅读
提出一种基于反射光谱分析的非在位膜厚控制技术,首先利用椭圆偏振光谱仪确定波长300～1 700 nm范围内的薄膜折射率,由此确定对应于特定波长(如1 550 nm)的最佳抗反射(AR)镀膜沉积条件。然后计算最佳AR镀膜厚度所对应的反射谱,得到相应的CIE标准色谱坐标。通过对比实测镀膜颜色和计算得到的最佳颜色,可以实现小尺寸器件端面上AR镀膜厚度的优化控制。利用这一方法,由等离子体增强化学气相沉积(PECVD)制备的SiNx单层AR镀膜,获得了4.4×10-4的反射率。
In this paper, a non-in-situ film thickness control technique based on reflectance spectroscopy is proposed. The refractive index of the film in the wavelength range of 300 ~ 1 700 nm is first determined by using an ellipsometer. The refractive index corresponding to a specific wavelength (eg, 1 550 nm) Good anti-reflection (AR) coating deposition conditions. Then calculate the reflection spectrum corresponding to the optimal AR coating thickness and obtain the corresponding CIE standard chromatographic coordinates. By contrasting the measured coating color and the calculated optimum color, optimal control of the AR coating thickness on the small-size device end face can be achieved. Using this method, a SiNx single layer AR coating prepared by plasma enhanced chemical vapor deposition (PECVD) yielded a reflectivity of 4.4 x 10-4.