论文部分内容阅读
将模拟退火 (SA)法应用于椭偏光谱数值反演 ,以达到同时得到介质薄膜的厚度和光学常数谱 ,并对 SA算法作了说明和改进 .作为应用实例 ,计算了 Si衬底上的 Si O2 薄膜和 Ba0 .9Sr0 .1 Ti O3(BST)铁电薄膜的膜厚及光学常数谱 ,同时讨论了椭偏参数ψ和Δ随膜厚及折射率变化的灵敏度 .
The simulated annealing (SA) method was applied to the numerical inversion of the ellipsometry to obtain the thickness and the optical constants spectrum of the dielectric thin film at the same time, and the SA algorithm was described and improved.As an application example, Si O2 thin films and Ba0 .9Sr0 .1 Ti O3 (BST) ferroelectric thin films were studied. The sensitivity of ellipsometric parameters ψ and Δ with the changes of film thickness and refractive index was also discussed.