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用射频等离子体增强化学汽相沉积技术合成Ｃ３Ｎ４薄膜，并采用强迫晶化技术，经透射电子衍射观测，薄膜具有多晶结构．用Ｘ射线光电子能谱测试了Ｃ，Ｎ原子结合能及含氮量．傅里叶变换红外光谱曲线表明薄膜中不含石墨相．测得薄膜的维氏硬度为２９．２—５０．０ＧＰａ
The C3N4 thin films were synthesized by radio frequency plasma enhanced chemical vapor deposition and the forced crystallization technique was used. The films were characterized by polycrystalline structure by transmission electron diffraction. X-ray photoelectron spectroscopy was used to test C and N atom binding energy and nitrogen content. Fourier transform infrared spectroscopy curve shows that the film does not contain graphite phase. The Vickers hardness of the film was measured to be 29.2-50.0 GPa