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在研究了射频离子源的结构、工作原理和性能的基础上,进行了光学镜面抛光离子束的去除效率与稳定性测试。实验结果表明射频离子源去除函数的形状为回转高斯形,利用Φ15mm的栅网,在靶距为30mm、离子能量900e V时,去除函数的峰值去除率为194nm/min,体积去除率为19.2×10-3mm3/min,半峰全宽值为9.2mm;并且去除函数的峰值去除率与体积去除率的变化均在3%以内,半峰全宽值的变化在1.7%以内。因此,射频离子源具有光学镜面抛光加工所需的去除效率,而且射频离子源具有好的稳定性,具备光学加工的潜能。
Based on the study of the structure, working principle and performance of RF ion source, the removal efficiency and stability of the optical mirror polished ion beam were tested. The experimental results show that the shape of the RF ion source removal function is gyrating Gaussian, and the removal efficiency of the removal function is 194 nm / min with the target distance of 30 mm and the ion energy of 900 e V using a grid of Φ 15 mm. The volume removal efficiency is 19.2 × 10-3mm3 / min, full width at half maximum (FWHM) of 9.2mm, and the peak removal and volume removal of the removal function are within 3% and the full width at half maximum (FWHM) are within 1.7%. Therefore, the RF ion source has the required removal efficiency for optical mirror finishing, and the radio frequency ion source has good stability and has the potential of optical processing.