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利用WO3和NiO的互补显色可以大大提高电致变色玻璃的变色效率。有关WO3薄膜的制备方法及其性能已有许多文献作了报道。已报道的NiOx薄膜常用金属镍的射频反应溅射或电子束反应蒸发方法制备。前者沉积速率较慢，电致变色响应速度及透射率变化范围均不如后者[1]。本文介绍的金属镍反应闪蒸方法无需电子束设备，所制备的G／ITO／NiOx系统在2MKOH溶液中的饱和着色和漂白的透射光谱测试表明，相对于人眼峰值响应（λ＝550nm）的透射率变化范围达60％以上，薄膜的电致变色响应速度、沉积速度也优于反应溅射工艺。
The use of WO3 and NiO complementary color development can greatly improve the electrochromic glass discoloration efficiency. There are many reports on the preparation and properties of WO3 thin films. It has been reported that NiOx thin films are usually prepared by RF reactive sputtering or electron beam evaporation of metallic nickel. The former deposition rate is slower, the electrochromic response speed and transmittance range than the latter [1]. The nickel-based reaction flash evaporation method described in this paper does not require electron beam devices. The transmission spectra of saturated tinted and bleached G / ITO / NiOx systems prepared in 2M KOH solution show that the peak response (λ = 550 nm) The transmittance range of more than 60%, the electrochromic response speed of the film, the deposition rate is also better than the reactive sputtering process.