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真空电弧放电法从1839年以来曾廣泛地用于高熔点纯金属的制备,而在这种真空熔炼过程的同时得到了这个工艺的副产品,那就是在真空室的壁上沉积了一层该金属的薄膜,这一发现给了人们一个启示,Lucas等人先后发表了文章,阐述了用真空电弧沉积技术制备高纯难熔金属,这一方法是借助于机械法使一个可移动的电极和另一个固定电极在接触和离开的瞬间引燃电弧,产生的蒸气束流集聚在基片上成膜.在基片与源相距4厘米情况下,获得了大致50埃/秒的沉积速率. 二次世界大战后,这门科学技术的研究得到了相应的发展,到了六十年代初期受到了工程界的普
The vacuum arc discharge method has been widely used for the preparation of high-melting point pure metals since 1839. A by-product of this process was obtained at the same time as this vacuum smelting process by depositing a layer of the metal on the wall of the vacuum chamber This discovery has given people a revelation, Lucas et al. Have published an article describing the use of vacuum arc deposition technology to prepare high-purity refractory metal, this method is by mechanical method to make a movable electrode and the other A fixed electrode ignited the arc at the instant of contact and departure and the resulting vaporous beam was concentrated on the substrate to form a film. A deposition rate of approximately 50 Angstroms / second was obtained at a substrate distance of 4 cm from the source. After World War II, this science and technology research has been the corresponding development, by the early 1960s by the engineering community