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微波电子回旋共振（delectroncyclotronresonance．ECR）等离子体溅射法是能在低温下制备高质量薄膜的最新镀膜技术．在该技术中，微波输入窗口易受金属粒子污染，导致微波在窗口反射，从而影响装置的正常工作。本文初步探讨了在ECR溅射装置中．采用真空波导与共振腔连成一体，在连接处配置磁轭（纯铁）．通过改变共振腔与波导连接处的磁场分布，能有效的避免微波窗口污染的技术途径，并较细致的研究了该装置的放电特性。
Microwave electron cyclotron resonance (delectroncyclotronresonance.ECR) Plasma sputtering is the latest coating technology for producing high quality films at low temperatures. In this technology, the microwave input window is easily contaminated by metal particles, causing microwaves to reflect at the window, thus affecting the normal operation of the device. This article first explored the ECR sputtering device. Using a vacuum waveguide and resonant cavity into one, the junction configuration yoke (pure iron). By changing the distribution of the magnetic field between the resonator and the waveguide, the microwave window can be effectively avoided, and the discharge characteristics of the device are studied in detail.