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借助循环伏安(CV)和计时安培(CA)研究了在不同电位下,纳米Al2O3微粒对镍由硫酸盐混合溶液在铜基底上电结晶沉积的影响.结果表明,Ni-Al2O3镀液体系电沉积的起始电位约为-740 mV.随着阶跃电位负移,Ni-Al2O3镀液体系电沉积成核时间tm逐渐缩短.与纯Ni镀液体系电沉积的tm相比,在-740~-830mV较低阶跃电位下,Ni-Al2O3镀液体系电沉积的成核时间tm明显缩短,表明Al2O3微粒有助于镍的电结晶成核.在-890 mV阶跃电位下,Ni-Al2O3镀液体系电沉积初始阶段的成核过程满足Scharifker-Hills三维瞬时成核模型.
The effects of nano-sized Al 2 O 3 particles on the electrocrystallization of nickel by sulphate mixed solution on copper substrate were investigated by cyclic voltammetry (CV) and time-ampere-ampere (CA). The results show that the electrocrystallization of Ni- The initial potential of the deposition is about -740 mV.With the negative step potential shift, the electrodeposition nucleation time tm of Ni-Al2O3 bath system is gradually shortened.Compared with the tm electrodeposition of pure Ni bath system, ~ -830mV lower step potential, Ni-Al2O3 bath electrodeposition of the electrodeposition time tm significantly shortened, indicating that Al2O3 particles contribute to the nucleation of nickel nucleation at -890 mV step potential, Ni- The nucleation process in the initial stage of electrodeposition of Al2O3 bath system meets the Scharifker-Hills three-dimensional transient nucleation model.