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本文描述在ＣＯＲＮＩＮＧ７０５９玻璃衬底上用磁挖射频溅射法制备Ｎｂ／ＡｌＯｘ／Ｎｂ约瑟夫森结的质量和工艺条件的相关规律。由Ｘ荧光测量和扫描电镜观测，分别研究膜的Ａｒ浓度ＣＡｒ与偏压Ｖｂ的关系和膜的表面形貌与结构。并对Ｖｂ和气体压力ＰＡｒ对膜应力和结构的影响作探讨．对Ｎｂ／ＡｌＯｘ／Ｎｂ约瑟夫森的介面及各种氧化参数的影响研究发现：膜的厚度、氧化温度、层序、薄的自然氧层的存在等因素对介面的质量有大的影响。通过对体现结特性的阳极氧化电压谱图的测量比较，我们确认介面的陡度与结的质量相关，即与超导特性相关。ＡｌＯｘ阻挡层的Ａｌ层厚度的最小最佳值为０．７ｎｍ。
This article describes the CORNING7059 glass substrate prepared by magnetic RF sputtering frequency of Nb / AlOx / Nb Josephson junction quality and process conditions of the law. By X-ray fluorescence measurement and scanning electron microscopy, respectively, the relationship between the membrane Ar concentration CAr and bias Vb and the membrane surface morphology and structure. The influence of Vb and gas pressure PAr on membrane stress and structure was also discussed. The influence of Nb / AlOx / Nb Josephson interface and various oxidation parameters was studied. It was found that the thickness of interface, the oxidation temperature, the sequence and the existence of a thin natural oxygen layer have a great influence on the interface quality. By comparing the anodic oxidation voltage spectra that show the properties of the junction, we confirm that the steepness of the interface is related to the quality of the junction, ie to the superconducting properties. The minimum optimum value of the Al layer thickness of the AlOx barrier layer is 0.7 nm.