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本文介绍一种利用高功率脉冲电子束溅射法制备金属多层膜的新方法。强脉冲电子束轰击金属靶将产生瞬态高温等离子体,从这种等离子体中飞出的金属离子沉积在附近的衬底上,从而制得Co/Ti系和其他多种金属多层膜。本文报道了对多层膜进行的TEM和AES研究的结果。
This paper presents a new method for preparing metal multilayers using high power pulsed electron beam sputtering. High-intensity pulsed electron beam bombardment of the metal target produces a transient high-temperature plasma from which metal ions flying from the plasma are deposited on the nearby substrate, resulting in Co / Ti-based and many other multi-layered metal films. This paper reports the results of TEM and AES studies on multilayer films.