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玉环县电子设备厂,在华东师大、上海元件五厂的大力协助下,最近研制成功两种适应国内急需的提高半导体器件生产质量的关键性设备——DD—P250型等离子沉积台和DK一200型平板等离子刻蚀台,经中科院上海冶金所、上海元件五厂、桐庐晶体管厂、上海无线电十七厂等单位使用,效果良好,已于今年五月在桐庐由玉环县科委主持通过技术鉴定。等离子体增强化学气相沉积设备,是利用非平衡等离子中,非平衡电子具有较高的能量,在较低的温度下,实现在通常条件下要在高温下才能实现的许多化学反应。
Yuhuan County Electronic Equipment Factory, with the great assistance from East China Normal University and Shanghai Components Factory 5, recently developed two key equipment to meet the domestic urgent need to improve the production quality of semiconductor devices - DD-P250 plasma deposition station and DK 200 plate plasma etching Taiwan, the Chinese Academy of Sciences Shanghai Metallurgical Institute, Shanghai Components Factory 5, Tonglu transistor plant, Shanghai Radio 17 plants and other units, the effect is good, in May this year, Tonglu Yuhuan County Science and Technology Commission presided over by technology Identification. Plasma enhanced chemical vapor deposition equipment, the use of non-equilibrium plasma, non-equilibrium electrons with high energy, at lower temperatures, under normal conditions to achieve at high temperatures to achieve many chemical reactions.