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本文对发射光谱胡测定纯钨中痕量杂质元素方法中的裁体、缓冲剂组份、电极规格以及激发电源参数进行了研究,拟定了以国产一米光栅摄谱仪、设备和试剂,一次摄谱,同时测定钠、铍、镁、钙、钡、铝、铜、锌、铁、锰、镍、钴、钛、钒、铬、钼、钪、镱、硅、铅、铋、锡、锑、镉、砷二十五个痕量杂质元素的方法。测定下限是0.004—4ppm,测定下限总量为22.414ppm,相对标准偏差为1.6—27.7％。操作简便快速,灵敏、准确。
In this paper, the method of determining the amount of trace impurities in pure tungsten emission spectrometry was investigated, the parameters of the buffer, the electrode specifications and the excitation power were studied. A domestic one-meter grating spectrometer, equipment and reagents, Spectroscopy and determination of sodium, beryllium, magnesium, calcium, barium, aluminum, copper, zinc, iron, manganese, nickel, cobalt, titanium, vanadium, chromium, molybdenum, scandium, ytterbium, silicon, lead, bismuth, tin, antimony , Cadmium, arsenic twenty-five trace impurity elements. The lower limit of determination is 0.004-4ppm, the lower limit of determination is 22.414ppm, and the relative standard deviation is 1.6-27.7%. Easy to operate fast, sensitive and accurate.