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采用俄罗斯UVN 0.5D2I离子束辅助电弧离子镀沉积设备,利用N离子束轰击高速钢W18Cr4V基材上电弧离子镀已沉积完毕的TiAlN膜层。研究了不同能量的N离子束轰击对TiAlN膜层表面形貌、显微硬度和相结构的影响。SEM分析表明:TiAlN膜层表面“大颗粒”消失,凹坑浅而平整,粗糙度降低。X射线衍射分析表明:无N离子轰击时,TiAlN膜层是由TiAlN相和Ti2AlN相组成;随着轰击能量的增加,TiAlN膜层的相结构没有发生变化,但TiAlN(111)取向减弱,而(200)和(220)取向均增强;Ti2AlN(211)取向减弱。力学性能测试表明:N离子束轰击,使膜层的显微硬度由原来的2 100HV0.01提高到2 300HV0.01。
Russia UVN 0.5D2I ion beam assisted arc ion plating deposition equipment, the use of N ion beam bombardment of high speed steel W18Cr4V substrate arc ion plating has been deposited TiAlN film. The effects of N ion beam bombardment with different energies on the surface morphology, microhardness and phase structure of TiAlN films were investigated. SEM analysis shows that: the surface of TiAlN film “big particles ” disappear, the pit is shallow and smooth, the roughness decreases. X-ray diffraction analysis shows that TiAlN layer is composed of TiAlN phase and Ti2AlN phase without N ion bombardment. With the increase of bombardment energy, the phase structure of TiAlN layer does not change, but the orientation of TiAlN (111) (200) and (220) orientation are enhanced; Ti2AlN (211) orientation is weakened. Mechanical tests show that: N ion beam bombardment, the film hardness increased from the original 2 100HV0.01 to 2 300HV0.01.