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用沟道离子注入法生成的稀土硅化物产物经背散射沟道分析、电镜分析和Ｘ射线衍射测 试表明：它具有很好的结晶品质（ＥｒＳｉ１．７的Ｘｍｉｎ值可低到１．５％）和很高的相稳定性。
The results of backscatter channel analysis, electron microscopy and X-ray diffraction show that the rare earth silicide product produced by channel ion implantation has good crystal quality (the Xmin value of ErSi1.7 can be as low as 1.5%), And high phase stability.