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单步循环过滤,用来去除胶体硅基化学机械抛光(CMP)磨料中尺寸过大的微粒。已证实适当的过滤获得了尺寸过大粒子的快速去除,而不改变CMP磨料中固体粒子浓度的百分比。为模拟CMP磨料分配系统的粒子减少开发了数字模型。这些模型预测了粒子浓度与流速、过滤器的粒子去除效率及过滤时间的关系。这些模型表明,为获得尺寸过大粒子的快速去除,流速是最关键的参数。预先过滤的主要作用是截获部分尺寸过大的粒子,并保护最终过滤不被过早的堵塞,以便提供过滤器最大的使用寿命。根据有限数据的检验,循环流程模型足以预测粒子浓度形貌图。归根结底,最佳过滤器的选择决定了流速、过滤器的粒子去除效率、过滤方案(单步与多步过滤)和过滤器的使用寿命。
Single-cycle filtration is used to remove oversize particles from colloidal silicon-based chemical mechanical polishing (CMP) abrasives. Proper filtration has been proven to achieve rapid removal of oversize particles without changing the percentage of solid particle concentration in CMP abrasives. A digital model was developed to simulate particle reduction in CMP abrasive distribution systems. These models predict the relationship between particle concentration and flow rate, filter particle removal efficiency and filtration time. These models show that the flow rate is the most critical parameter in order to achieve rapid removal of oversized particles. The primary role of pre-filtration is to capture some of the oversized particles and to protect the final filter from premature blockage to provide the maximum filter life. According to the test of finite data, the circulation process model is enough to predict the particle concentration topography. Ultimately, the choice of the best filter determines the flow rate, the particle removal efficiency of the filter, the filtration options (single-step and multi-step filtration) and the filter’s useful life.