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本文对不同性质的膜─基体系通过确定Ｃ的具体取值对Ｊｏｅｎｓｓｏｎ－Ｈｏｇｍａｒｋ模型予以修正，研究厂等离子体增强化学气相沉积Ｔｉ（Ｃ，Ｎ）薄膜的硬度及其随成分组织的变化。Ｔｉ（Ｃ、Ｎ）薄膜具有较小的晶粒尺寸和较高的残余压应力，其硬度远高于一般的整体材料，在确定的。工艺条件下，其值上要取决于膜的含碳量，大体成线性增加关系。
In this paper, the Joensson-Hogmark model is modified by determining the specific value of C for film-based systems of different properties to study the hardness and the compositional changes of Ti (C, N) thin films deposited by plasma enhanced chemical vapor deposition. Ti (C, N) thin films have smaller grain size and higher residual compressive stress, and their hardness is much higher than that of the general bulk materials. Under process conditions, the value depends on the carbon content of the membrane and generally increases linearly.