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采用射频磁控溅射法在室温柔性衬底PET上制备了掺锆氧化锌(ZZO)透明导电薄膜。利用不同方法提高了ZZO薄膜的电阻率而未使其可见光透过率降低。X射线衍射(XRD)和扫描电子显微镜(SEM)表明,ZZO薄膜为六角纤锌矿结构的多晶薄膜。在有机衬底和玻璃衬底上制备ZZO薄膜的择优取向不同,前者为(100)晶面,而后者为(002)晶面。在有ZnO缓冲层的PET衬底上制备的ZZO薄膜电阻率比直接生长在玻璃衬底样品上的小。通过优化参数,在PET衬底上制备出了最小电阻率为1.7×10-3Ω.cm、可见光透过率超过93%的ZZO薄膜。实验表明,镀膜之前在柔性衬底上沉积ZnO缓冲层能有效地提高ZZO薄膜的质量。
Zirconium-doped Zinc Oxide (ZZO) transparent conductive films were prepared on radio-frequency magnetron sputtering at room temperature on flexible PET substrate. Different methods are used to increase the resistivity of the ZZO thin film without reducing its visible light transmittance. X-ray diffraction (XRD) and scanning electron microscopy (SEM) showed that the ZZO thin films were polycrystalline with hexagonal wurtzite structure. The preferred orientation of the ZZO thin films fabricated on organic substrates and glass substrates is different, with the former being the (100) plane and the latter being the (002) plane. The ZZO films prepared on ZnO substrates with ZnO buffer layer have lower resistivity than those grown directly on glass substrates. By optimizing the parameters, a ZZO thin film with a minimum resistivity of 1.7 × 10-3Ω.cm and visible light transmittance over 93% was prepared on PET substrate. Experiments show that, before coating on the flexible substrate deposited ZnO buffer layer can effectively improve the quality of ZZO film.