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本文提出并初步实现一种提高等离子显示面板(PDP)出光率的多层干涉型反射膜,其中高折射率材料采用金属诱导多晶硅,低折射率材料采用二氧化硅,并通过实验得到了可见光波段平均反射率为80%的平面高反膜。实验中采用半圆管替代实际PDP中的障壁结构,并且通过蒙特卡罗方法分析了粒子在磁控溅射中沉积到半圆管壁上的过程,得到了薄膜在样片不同圆心角处的厚度分布。模拟实验表明改善膜厚均匀性的主要途径是提高溅射气压。通过简易可靠的反射率测试系统,在红光波段对曲面上的薄膜进行了反射率测量,初步证明所提结构和制备方法的可行性。在0.7 Pa的气压下,溅射沉积得到的样品的反射率为50%～65%。
In this paper, a multi-layer interference type reflective film for improving the light output of a plasma display panel (PDP) is proposed and initially implemented, wherein the high refractive index material uses metal-induced polycrystalline silicon and the low refractive index material uses silicon dioxide, and the visible wavelength band The average reflectivity of 80% of the plane high reflective film. Semi-circular tube was used in the experiment to replace the barrier structure in actual PDP. The process of particle deposition on semicircular tube wall by magnetron sputtering was analyzed by Monte-Carlo method. The thickness distribution of the film at different central angles was obtained. Simulation experiments show that the main way to improve the film thickness uniformity is to increase the sputtering pressure. Through the simple and reliable reflectivity test system, the reflectivity of the thin film on the curved surface was measured in the red band, which proves the feasibility of the proposed structure and preparation method. The reflectivity of the sputter-deposited samples was 50% -65% at a pressure of 0.7 Pa.