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以甲苯(C7H8)和四甲基硅烷(Si(CH3)4)的混合气体为反应气源,使用离子气相沉积技术制备了不同Si含量(原子比)(不超过20%)的掺硅类金刚石(Si-DLC)薄膜,用X射线光电子谱和拉曼光谱测出薄膜和对磨钢球上转移膜的微观结构,纳米压痕仪、摩擦试验机和电子探针微分析仪分别得到薄膜的硬度、摩擦系数、磨痕和转移膜的元素变化结果。结果表明,添加少量Si能提高Si-DLC薄膜的硬度,但是Si含量的进一步增加则使薄膜的硬度降低。而薄膜的摩擦系数始终随着Si含量的增加而减少。从摩擦实验后钢球表面转移膜的进一步分析,我们认为该薄膜的低摩擦特性是由于转移膜的增加和石墨化两者共同造成的结果。
Silicon-doped diamond with different Si content (atomic ratio) (not more than 20%) was prepared by ion-vapor deposition using a mixed gas of toluene (C7H8) and tetramethylsilane (Si (CH3) 4) (Si-DLC) film, the film and the microstructure of the transfer film on the ball mill were measured by X-ray photoelectron spectroscopy and Raman spectroscopy. The nano-indenter, the friction tester and the electron probe microanalysis Hardness, coefficient of friction, wear marks and transfer film elemental changes in the results. The results show that the addition of a small amount of Si can improve the hardness of the Si-DLC film, but the further increase of Si content makes the film hardness decrease. The friction coefficient of the film always decreases with the increase of Si content. From the further analysis of the transfer film on the surface of the steel ball after the friction experiment, we believe that the low friction characteristic of the film is the result of both the increase of the transfer film and the graphitization.