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本文介绍了用光刻胶复制高精度黑铬度盘的工艺流程。该方法由于度盘采用先铬后胶工艺, 用真空蒸镀黑铬,黑铬线条反射率约5％,线条间隔铝的反射率约为90％,反差高、对比好,改善了光电转换信号的效果,线条牢固度也较好;並由于应用的光刻胶为高分子化学合成的高纯度光敏性物质,故分子结构性能稳定,复制精度损失小,且波动范围窄,成品率较高。文章还提出了在操作中应注意的问題。
This article describes the process of using photoresist to replicate high precision black chrome discs. The method adopts the technology that the chrome plate adopts the first chrome and the back glue process, the black chrome is vacuum-evaporated, the reflectivity of the black chrome line is about 5%, the reflectivity of the aluminum of the line interval is about 90%, the contrast is high and the contrast is good, As a result, the photoresist used is a high-purity photosensitive material synthesized by a macromolecule. Therefore, the molecular structure has stable performance, small loss of replication precision, narrow fluctuation range and high yield. The article also raised some problems that should be paid attention to in the operation.