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Yttrium oxide thin films have been deposited on Si(100) substrate by using pulsed laser deposition(PLD) method.X-ray difraction(XRD),hard and soft X-ray absorption spectroscopy(XAFS) are employed to investigate the origin of oxygen vacancies and their influence on the structure and atomic distributions.The XRD results indicate that the Y_2O_3 thin films strongly orient the(111) axis of the cubic structure.Analyses on the Y K-edge extended X-ray absorption fine structures reveal that the coordination number of Y atoms decreases and the bond length of Y-O contracts due to the loss of oxygen atoms.The X-ray absorption near edge structure analysis together with a theoretical approach further confirms the oxygen vacancies formation and their possible location.
Yttrium oxide thin films have been deposited on Si (100) substrates by using pulsed laser deposition (PLD) method. X- ray difraction (XRD), hard and soft X-ray absorption spectroscopy vacancies and their influence on the structure and atomic distributions. The XRD results indicate that the Y_2O_3 thin films strongly orient the (111) axis of the cubic structure. An analysis of the Y K-edge extended X-ray absorption fine structures reveals that the coordination number of Y variations decreases and the bond length of YO contracts due to the loss of oxygen atoms. The X-ray absorption near edge structure analysis together with a theoretical approach further confirms the oxygen vacancies formation and their possible location.