Metal Organic Chemical Vapour Deposited Thin Films of Cobalt Oxide Prepared via Cobalt Acetylacetona

• 作 者: C.U. Mordi M.A. Eleruja B.A. T
• 机 构: DepartmentofPhysics,DepartmentofChemistry,DepartmentofPhysics,DepartmentofElectronicsandElectricalEn
• 出 处: 材料科学技术学报：英文版
• 发表日期: 2009年1期
• 关键词: 薄膜 氧化物 金属有机化学蒸汽沉积 反射光谱学 Precursor Thin film Oxide Metal organic chemical vapo
• 基金项目: The RBS was carried out at the D.R. Chick Accel- erator Laboratory, University of Surrey. We thank the Third World Academy of Science （TWAS, Grant #93- 058 R6/PHYS/AF/AC） and Obafemi Awolowo Universit

The single solid source precursor, cobalt (Ⅱ) acetylacetonate was prepared and characterized by infrared spec-troscopy. Thin films of cobalt oxide were deposited on soda lime glass substrates through the pyrolysis (metal organic chemical vapour deposition