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Multiple phase-shifted (MPS) diffraction grating is an effective way proposed to overcome the spatial hole buing (SHB) effect in a distributed feedback (DFB) laser.We present two symmetric λ/8 phase-shifted DFB lasers by using nanoimprint lithography (NIL).The threshold current of a typical laser is less than 15 mA.The side mode suppression ratio (SMSR) is still above 42dB even at 100mA current injection.To show the versatility of NIL,eight different wavelength MPS-DFB lasers on this single chip are also demonstrated.Our results prove that NIL is a promising tool for fabricating high performance complex grating DFB lasers.