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自六十年代初剑桥大学A.N.Broers在第六届三束国际会议上发表了可以利用电子束进行微细加工的理论和实验之后,68年美国OKeeffe等人提出采用电子束投影成像曝光法制作集成电路。到70年代中期,只短短十几年,电子束微细加工已经从诞生、成长走向成熟阶段。在这段过程中,曾经突破了几项关键技术。比如用L_aB_6提高电子枪的亮度;提高电子束的扫描速度;提高工件台定位精度和扫描速度;改变束斑形状等。其中,研究数字定
Since the early sixties of Cambridge University ANBroers at the sixth three-beam International Conference published electron beam can be used for micro-machining theory and experiments, the United States 68 years the United States OKeeffe et al proposed electron beam projection imaging exposure of integrated circuits . To the mid-70s, just a dozen years, electron beam micro-processing has been born, grew to mature stage. During this period, several key technologies have been broken through. Such as L_aB_6 to improve the brightness of the electron gun; to improve the electron beam scanning speed; improve the positioning accuracy and scanning speed of the workpiece table; change the beam spot shape. Among them, the research figures set