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紫外光通信作为一种新型通信手段,以其保密性高、抗干扰能力强等优点在军事领域得到越来越广泛的重视。为满足紫外光通信系统的要求,在Φ210mm的石英基底上,制备了254nm,反射率大于95%,280～600nm平均透射率大于98%并满足角度12°～30°的滤光膜。通过对几种常见紫外材料进行对比研究,选定HfO2和MgF2作为高低折射率材料。以膜系设计理论为基础,通过膜堆的叠加来展宽反射带,结合针法优化,设计出滤光膜的膜系。在薄膜制备中,通过优化各项工艺参数减少了吸收,使用离子辅助沉积提高了成膜质量,并通过对工艺参数重复性的精确控制,提高了膜厚的控制精度。实验结果显示制备的滤光膜满足要求。
As a new communication method, UV communication has gained more and more attention in military field due to its high confidentiality and strong anti-interference ability. In order to meet the requirement of UV communication system, a filter with 254nm, reflectance greater than 95%, 280-600nm average transmittance greater than 98% and angle of 12 ° ~ 30 ° was prepared on Φ210mm quartz substrate. By comparing several common UV materials, HfO2 and MgF2 were selected as high and low refractive index materials. Based on the theory of membrane system design, the reflection band is broadened by the stacking of membrane stacks, and the membrane system of the filter membrane is designed by the optimization of the needle method. In the preparation of thin films, the absorption is reduced by optimizing various process parameters, the quality of film formation is improved by ion-assisted deposition, and the control precision of the film thickness is improved by precisely controlling the repeatability of process parameters. Experimental results show that the prepared filter to meet the requirements.