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本文应用 Ｘ射线衍射分析和电子衍射分析研究了Ａ３钢基体磁控溅射离子镀铝 膜的相组成，结果表明，膜的相组成主要是基板负偏压所决定的。文中论述了正离子 对基板的溅射作用所引起的靶材原子和基板（基体）原子在基板上共同沉积的成膜机 理。
In this paper, X-ray diffraction and electron diffraction analysis were used to study the phase composition of the magnetron sputtered ion-aluminized film of A3 steel substrate. The results show that the phase composition of the film is mainly determined by the substrate negative bias voltage. In this paper, the formation mechanism of co-deposition of target atoms and substrate (matrix) atoms on the substrate caused by the positive ion sputtering on the substrate is discussed.